Le pompage des liquides chargés = The filled liquid pumpingDEPLAT, L.Environnement & technique. 1999, Num 185, pp 29-32, issn 0986-2943Article

Don't get stuck on sludge handlingCARSON, John W.Chemical engineering (New York, NY). 2002, Vol 109, Num 1, pp 79-81, issn 0009-2460Article

Eine neue wirtschaftlich arbeitende Trübepumpe von Krebs = A new cost-efficient slurry pump from KrebsAT. Aufbereitungs-Technik (1990). 2000, Vol 41, Num 6, pp 296-298, issn 1434-9302Conference Paper

Rheology of high-solids biomass slurries for biorefinery applicationsKNUTSEN, Jeffrey S; LIBERATORE, Matthew W.Journal of rheology (New York, NY). 2009, Vol 53, Num 4, pp 877-892, issn 0148-6055, 16 p.Article

Cryogenic design of an isodynamic magnetic separatorTUISKU, Juha; AHORANTA, Maria; KORPELA, Aki et al.IEEE transactions on applied superconductivity. 2004, Vol 14, Num 2, pp 1580-1583, issn 1051-8223, 4 p.Conference Paper

Improved design practices for slurry piping systemsGROSSEL, S. S.Chemical engineering (New York, NY). 1998, Vol 105, Num 4, pp 114-117, issn 0009-2460Article

Analytical uses of ultrasound. II. Detectors and detection techniquesPRIEGO-CAPOTE, F; LUQUE DE CASTRO, M. D.TrAC. Trends in analytical chemistry (Regular ed.). 2004, Vol 23, Num 10-11, pp 829-838, issn 0165-9936, 10 p.Article

A general optimization for slurry injection during chemical mechanical polishingCHOU, Fu-Chu; FU, Ming-Nan; WANG, Ming-Wen et al.Journal of the Electrochemical Society. 2000, Vol 147, Num 10, pp 3873-3878, issn 0013-4651Article

Electrowinning from copper-DETA complexesFELSHER, D; FINCH, J. A; DISTIN, P. A et al.Canadian metallurgical quarterly. 2000, Vol 39, Num 3, pp 291-296, issn 0008-4433Article

Modelling high concentration settling slurry flowsGILLIES, Randall G; SHOOK, Clifton A.Canadian journal of chemical engineering. 2000, Vol 78, Num 4, pp 709-716, issn 0008-4034Article

La stabilisation s'industrialise = The stabilization industrializes itselfBARLET, P.CETIM informations. 1998, Num 161, issn 0399-0001, p. 31Article

Control of high solid content yttria slurry with low viscosity for gelcastingTAKAI, Chika; TSUKAMOTO, Masashi; FUJI, Masayoshi et al.Journal of alloys and compounds. 2006, Vol 408-12, pp 533-537, issn 0925-8388, 5 p.Conference Paper

Charakterisierung von Poliersuspensionen für das chemisch-mechanische Polieren (CMP) von Waferoberflächen in der Halbleiterindustrie = Characterization of polishing slurries for the chemical mechanical polishing (CMP) of wafer surfaces in the semiconductor industryKUNTZSCH, Timo; WITNIK, Ulrike; STINTZ, Michael et al.Wissenschaftliche Zeitschrift der Technischen Universität Dresden. 2003, Vol 52, Num 4, pp 108-112, issn 0043-6925, 5 p.Article

Wafering of silicon crystalsMÖLLER, H. J.Physica status solidi. A, Applications and materials science (Print). 2006, Vol 203, Num 4, pp 659-669, issn 1862-6300, 11 p.Conference Paper

Visualized characterization of slurry film between wafer and pad during chemical mechanical planarizationHONG HOCHENG; CHENG, Chih-Yung.IEEE transactions on semiconductor manufacturing. 2002, Vol 15, Num 1, pp 45-50, issn 0894-6507Article

Pompes rotodynamiques de technologie particulière = Rotodynamic pumps using particular technologyPOULAIN, Jean.Techniques de l'ingénieur. Génie mécanique. 1998, Vol BL3, Num BM4317, pp BM4317.1-BM4317.22, issn 1762-8768Article

High gradient magnetic separation using superconducting bulk magnetsYOKOYAMA, K; OKA, T; OKADA, H et al.Physica. C. Superconductivity and its applications. 2003, Vol 392-96, pp 739-744, 6 p., 1Conference Paper

Pursuing engineering best practice IEAust 2002 AGM Michell MedalWIGHTLEY, Allan C.Mechanical engineering transactions (1995). 2002, Vol 25, Num 2, pp 93-102, issn 1328-9160, 10 p.Article

Planarization process of single crystalline silicon asperity under abrasive rolling effect studied by molecular dynamics simulationLINA SI; DAN GUO; JIANBIN LUO et al.Applied physics. A, Materials science & processing (Print). 2012, Vol 109, Num 1, pp 119-126, issn 0947-8396, 8 p.Article

Modeling of dual emission laser induced fluorescence for slurry thickness measurements in chemical mechanical polishingGRAY, Caprice; ROGERS, Chris B; MANNO, Vincent P et al.Experiments in fluids. 2011, Vol 51, Num 1, pp 281-293, issn 0723-4864, 13 p.Article

The evaluation and use of antiscale additives in the magnesium bisulfite recovery processHARPER, Stephen; SLATTERY, Shaun.Appita journal. 2004, Vol 57, Num 5, pp 372-376, issn 1038-6807, 5 p.Conference Paper

Effective refractive index of calcium carbonate pigment slurries by a surface-plasmon-resonance sensorJÄÄSKELÄINEN, Anssi; PEIPONEN, Kai-Erik; TAPPER, Unto et al.Dyes and pigments. 2002, Vol 52, Num 1, pp 15-21, issn 0143-7208Article

Effects of slurry rheology on industrial grinding performanceSHI, F. N; NAPIER-MUNN, T. J.International journal of mineral processing. 2002, Vol 65, Num 3-4, pp 125-140, issn 0301-7516Article

Modelling of rheological behaviour of semisolid metal slurries. Part 1: TheoryCHEN, J. Y; FAN, Z.Materials science and technology. 2002, Vol 18, Num 3, pp 237-242, issn 0267-0836Article

On-line solids hold-up measurement in mineral slurries by the standard addition methodARIZMENDI-MORQUECHO, A. M; PEREZ-GARIBAY, R; URIBE-SALAS, A et al.Minerals engineering. 2002, Vol 15, Num 1-2, pp 61-64, issn 0892-6875Article